ROUNDLAB Pine Calming Cica Mask (1 EA)
Innovate mask with a double wave sheet packed with calming essence - delivering unrivaled moisture and soothing cool. Gently but effectively removes dead skin cells and clears away clogged pores.
HOW TO USE:
After cleansing and toning, leave mask on for 10 - 20 minutes. After removal, tap lightly across face for residual contents to be fully absorbed.
INGREDIENTS:
Water, Pinus Densiflora Leaf Extract (151,272ppm), Glycerin, Dipropylene Glycol, Glycereth-26, Centella Asiatica Extract (10,150ppm), Hyaluronic Acid, Hydrolyzed Hyaluronic Acid, Sodium Hyaluronate, Butylene Glycol, Portulaca Oleracea Extract, Propanediol, Chondrus Crispus, Ethylhexylglycerin, Biosaccharide Gum-1, Glycoproteins, Ammonium Polyacryloyldimethyl Taurate, Tromethamine, Polyglyceryl-4 Caprate, Asiaticoside (0.1546ppm), Asiatic Acid (0.1546ppm), Madecassoside (0.1546ppm), Madecassic Acid (0.1546ppm), Polyglyceryl-6 Caprylate, Capryloyl Salicylic Acid, Hydroxyethylcellulose, 1,2-Hexanediol, Hydroxyacetophenone, Disodium EDTA, Xanthan Gum, Carbomer
Product Information
Product Information
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Shipping & Returns
ROUNDLAB Pine Calming Cica Mask (1 EA)
ROUNDLAB Pine Calming Cica Mask (1 EA)
Innovate mask with a double wave sheet packed with calming essence - delivering unrivaled moisture and soothing cool. Gently but effectively removes dead skin cells and clears away clogged pores.
HOW TO USE:
After cleansing and toning, leave mask on for 10 - 20 minutes. After removal, tap lightly across face for residual contents to be fully absorbed.
INGREDIENTS:
Water, Pinus Densiflora Leaf Extract (151,272ppm), Glycerin, Dipropylene Glycol, Glycereth-26, Centella Asiatica Extract (10,150ppm), Hyaluronic Acid, Hydrolyzed Hyaluronic Acid, Sodium Hyaluronate, Butylene Glycol, Portulaca Oleracea Extract, Propanediol, Chondrus Crispus, Ethylhexylglycerin, Biosaccharide Gum-1, Glycoproteins, Ammonium Polyacryloyldimethyl Taurate, Tromethamine, Polyglyceryl-4 Caprate, Asiaticoside (0.1546ppm), Asiatic Acid (0.1546ppm), Madecassoside (0.1546ppm), Madecassic Acid (0.1546ppm), Polyglyceryl-6 Caprylate, Capryloyl Salicylic Acid, Hydroxyethylcellulose, 1,2-Hexanediol, Hydroxyacetophenone, Disodium EDTA, Xanthan Gum, Carbomer
Original: $3.92
-70%$3.92
$1.18Product Information
Product Information
Shipping & Returns
Shipping & Returns
Description
Innovate mask with a double wave sheet packed with calming essence - delivering unrivaled moisture and soothing cool. Gently but effectively removes dead skin cells and clears away clogged pores.
HOW TO USE:
After cleansing and toning, leave mask on for 10 - 20 minutes. After removal, tap lightly across face for residual contents to be fully absorbed.
INGREDIENTS:
Water, Pinus Densiflora Leaf Extract (151,272ppm), Glycerin, Dipropylene Glycol, Glycereth-26, Centella Asiatica Extract (10,150ppm), Hyaluronic Acid, Hydrolyzed Hyaluronic Acid, Sodium Hyaluronate, Butylene Glycol, Portulaca Oleracea Extract, Propanediol, Chondrus Crispus, Ethylhexylglycerin, Biosaccharide Gum-1, Glycoproteins, Ammonium Polyacryloyldimethyl Taurate, Tromethamine, Polyglyceryl-4 Caprate, Asiaticoside (0.1546ppm), Asiatic Acid (0.1546ppm), Madecassoside (0.1546ppm), Madecassic Acid (0.1546ppm), Polyglyceryl-6 Caprylate, Capryloyl Salicylic Acid, Hydroxyethylcellulose, 1,2-Hexanediol, Hydroxyacetophenone, Disodium EDTA, Xanthan Gum, Carbomer
